The coexistence of two-dimensional electron and hole gases in GaN-based heterostructures
The coexistence of two-dimensional electron and hole gases in GaN-based heterostructures
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DOI:
10.1063/1.3688219
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发表时间:
2012-02-15
影响因子:
3.2
通讯作者:
Schwierz, F.
中科院分区:
文献类型:
--
作者:
Al Mustafa, N.;Granzner, R.;Schwierz, F.
The formation of two-dimensional carrier gases in gated GaN/AlGaN/GaN heterostructures is investigated theoretically. It is shown that under certain conditions a two-dimensional hole gas at the upper GaN/AlGaN interface can be formed in addition to the two-dimensional electron gas at the lower AlGaN/GaN interface. For the calculations, a Schrodinger-Poisson solver and a simple analytical model developed in the present work are used. Conditions for the formation of a two-dimensional hole gas are elaborated. It is shown that once a two-dimensional hole gas is created, it shields the coexisting two-dimensional electron gas which will result in a diminishing effect of the gate voltage on the two-dimensional electron gas. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3688219]