GaN on patterned silicon (GPS) technique for GaN-based integrated microsensors
GaN on patterned silicon (GPS) technique for GaN-based integrated microsensors
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DOI:
10.1109/iedm.2005.1609333
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发表时间:
2005-12
期刊:
影响因子:
--
通讯作者:
Zhenchuan Yang;Ruonan Wang;Deliang Wang;Baoshun Zhang;K.J. Chen;K. Lau
中科院分区:
文献类型:
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作者:
Zhenchuan Yang;Ruonan Wang;Deliang Wang;Baoshun Zhang;K.J. Chen;K. Lau
We demonstrated a viable technology for GaN-based integrated microsensors using the suspended GaN microstructures fabricated with GaN on patterned silicon technique. Fundamental characteristics of the GPS technique are investigated. Active devices (HEMT) were fabricated on the AlGaN/GaN cantilevers and qualitatively tested. The experiment shows that the HEMTs on cantilevers can effectively sense the change in the stress induced by deflections applied to the cantilevers