Observation of high electron emission yields following highly charged ion impact (up to Th75+) on surfaces.

Observation of high electron emission yields following highly charged ion impact (up to Th75+) on surfaces.
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在高带电离子(高达 Th75)撞击表面后观察到高电子发射产率。

DOI:
10.1103/physrevlett.68.2297
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发表时间:
1992
影响因子:
8.6
通讯作者:
Dewitt
Dewitt
中科院分区:
物理与天体物理1区
文献类型:
--
作者:
Mcdonald;Schneider;Clark;Dewitt

文献摘要

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测量了快(3.95 × 10{sup 7}cm/sec)Ar{sup 9,12,18 +}、Ne{sup 9+}、Nd {sup 30,44 +}和Th{sup 70,75 +}离子撞击Cu和Au靶后的双微分电子发射产额。电子发射主要由低能电子({lt}50 eV)控制。据发现,总产量,这上升到约100电子每离子,是一个非线性函数的入射离子的总势能(高达约200千电子伏)。
Double differential electron emission yields following the impact of fast (3.95{times}10{sup 7}cm/sec)Ar{sup 9,12,18+}, Ne{sup 9+}, Xe{sup 30,44+}, and Th{sup 70,75+} ions on Cu and Au targets have been measured. The electron emission is dominated by low-energy electrons ({lt}50 eV). It is found that the total yield, which rises to about 100 electrons per ion, is a nonlinear function of the total potential energy of the incident ion (up to about 200 keV).