Thermal near infrared monitoring system for electron beam melting with emissivity tracking
Thermal near infrared monitoring system for electron beam melting with emissivity tracking
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DOI：
10.1016/j.addma.2018.06.004
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发表时间：
2018-08-01
影响因子：
11
通讯作者：
Willmott, J. R.
中科院分区：
文献类型：
--
作者：
Boone, N.;Zhu, C.;Willmott, J. R.
本文介绍了一种高速、高分辨率硅基热像仪的设计及其在电子束熔炼添加剂制造系统温度分布热像中的应用。通常，热像是在中波长或长波长的红外辐射下产生的。使用硅焦平面阵列敏感的较短波长允许在光路中使用标准窗口。它还对机器进行了较少的修改，并使我们能够利用成熟的硅相机技术。有了这台新仪器，整个建筑区域的现场热成像成为可能，实现了缺陷检测和熔池跟踪。使用熔池跟踪来实现发射率校正算法，该算法能够产生更准确的熔化层区域的温度。
This paper presents the design of a high speed, high resolution silicon based thermal imaging instrument and its application to thermally image the temperature distributions of an electron beam melting additive manufacturing system. Typically, thermal images are produced at mid or long wavelengths of infrared radiation. Using the shorter wavelengths that silicon focal plane arrays are sensitive to allows the use of standard windows in the optical path. It also affords fewer modifications to the machine and enables us to make use of mature silicon camera technology. With this new instrument, in situ thermal imaging of the entire build area has been made possible at high speed, allowing defect detection and melt pool tracking. Melt pool tracking was used to implement an emissivity correction algorithm, which produced more accurate temperatures of the melted areas of the layer.