Positively Charged Additives Facilitate Incorporation in Inorganic Single Crystals.
Positively Charged Additives Facilitate Incorporation in Inorganic Single Crystals.
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带正电荷的添加剂促进无机单晶掺入。
DOI:
10.1021/acs.chemmater.2c00097
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发表时间:
2022-06-14
影响因子:
8.6
通讯作者:
Meldrum, Fiona C.
中科院分区:
文献类型:
--
作者:
Nahi, Ouassef;Broad, Alexander;Kulak, Alexander N.;Freeman, Helen M.;Zhang, Shuheng;Turner, Thomas D.;Roach, Lucien;Darkins, Robert;Ford, Ian J.;Meldrum, Fiona C.
Incorporation of guest additives within inorganic single crystals offers a unique strategy for creating nanocomposites with tailored properties. While anionic additives have been widely used to control the properties of crystals, their effective incorporation remains a key challenge. Here, we show that cationic additives are an excellent alternative for the synthesis of nanocomposites, where they are shown to deliver exceptional levels of incorporation of up to 70 wt % of positively charged amino acids, polymer particles, gold nanoparticles, and silver nanoclusters within inorganic single crystals. This high additive loading endows the nanocomposites with new functional properties, including plasmon coupling, bright fluorescence, and surface-enhanced Raman scattering (SERS). Cationic additives are also shown to outperform their acidic counterparts, where they are highly active in a wider range of crystal systems, owing to their outstanding colloidal stability in the crystallization media and strong affinity for the crystal surfaces. This work demonstrates that although often overlooked, cationic additives can make valuable crystallization additives to create composite materials with tailored composition–structure–property relationships. This versatile and straightforward approach advances the field of single-crystal composites and provides exciting prospects for the design and fabrication of new hybrid materials with tunable functional properties.
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影响因子:
16.6
作者:
Green, David C.;Ihli, Johannes;Thornton, Paul D.;Holden, Mark A.;Marzec, Bartosz;Kim, Yi-Yeoun;Kulak, Alex N.;Levenstein, Mark A.;Tang, Chiu;Lynch, Christophe;Webb, Stephen E. D.;Tynan, Christopher J.;Meldrum, Fiona C.
通讯作者:
Meldrum, Fiona C.
影响因子:
16.6
作者:
Andersson, M. P.;Dobberschutz, S.;Stipp, S. L. S.
通讯作者:
Stipp, S. L. S.
影响因子:
19
作者:
Ihli, Johannes;Bots, Pieter;Meldrum, Fiona C.
通讯作者:
Meldrum, Fiona C.
影响因子:
19
作者:
Cantaert, Bram;Kim, Yi-Yeoun;Meldrum, Fiona C.
通讯作者:
Meldrum, Fiona C.
影响因子:
29.4
作者:
Brif, Anastasia;Ankonina, Guy;Pokroy, Boaz
通讯作者:
Pokroy, Boaz