Stress analysis of film-on-substrate structure under tensile loads
Stress analysis of film-on-substrate structure under tensile loads
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拉伸载荷下薄膜基体结构的应力分析
DOI：
10.1016/j.mechmat.2018.02.003
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发表时间：
2018-05-01
影响因子：
3.9
通讯作者：
Li, Chuan-Wei
中科院分区：
文献类型：
--
作者：
Li, Lin-An;Li, Rong-Jian;Li, Chuan-Wei
本文研究了薄膜在拉伸载荷作用下的内应力分布。基于力平衡原理，推导了考虑薄膜层与衬底间力学参数不匹配的FOSS弹性问题的解析解。确定了单层FOSS和多层FOSS的应力分布。考虑了力学参数和结构厚度等影响因素对应力分布的影响。从本文的有限元计算结果来看，所提出的理论模型是可行的。并利用经典剪切滞后理论对所提方法进行了验证。结果表明，该模型对薄膜和厚膜都具有更广泛的适用性。
In this study, the internal stress distribution of a film on substrate structure (FOSS) under tensile loads has been analyzed. Based on force balance principles, analytical solutions are deduced to solve the elastic problem for the FOSS considering the mismatch of mechanical parameters between the film layer and the substrate. The stress distributions of both monolayer FOSS and multilayer FOSS are determined. The effect of the influencing factors such as mechanical parameters and structural thickness on stress distributions are taken into account. From the finite element method (FEM) results presented in this work, the proposed theoretical model is feasible. In addition, the classic shear-lag theory is employed to verify the proposed method. The result indicates that the proposed model has a more extensive applicability for both thin films and thick films.