Insight into the effect of surface structure on H2 adsorption and activation over different CuO(111) surfaces: A first-principle study

Insight into the effect of surface structure on H2 adsorption and activation over different CuO(111) surfaces: A first-principle study
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深入了解不同 CuO(111) 表面表面结构对 H-2 吸附和活化的影响:第一性原理研究

DOI:
10.1016/j.commatsci.2016.05.023
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发表时间:
2016-09-01
影响因子:
3.3
通讯作者:
Zhao, Qiang
Zhao, Qiang
中科院分区:
材料科学3区
文献类型:
--
作者:
Hao, Genyan;Zhang, Riguang;Zhao, Qiang

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采用密度泛函理论(DFT)方法,系统研究了H和H2-与CuO(111)表面的相互作用,包括完全表面、氧空位表面和预覆盖氧表面,探讨了表面结构对H2-吸附和活化的影响.结果表明,在完全表面和氧空位表面上,最外层的表面氧位(O-SUF)是H吸附的活性中心,而在预覆盖氧的CuO(111)表面上,H则优先吸附在预覆盖氧位(O-pre)上.在H-2吸附和活化的情况下,H-2是解离吸附在理想表面上,两个解离的H原子吸附在同一个OSUF位上,将OSUF原子从表面上拔出,形成一个吸附在亚表面铜位上的H2O分子(Cu-O),最终导致CuO(111)表面氧空位的形成。对于氧空位表面,H-2以侧吸附方式吸附在单配位(Cu-1)和双配位(Cu-2)的Cu-2位上是两种有利的构型,而且这两种有利构型的解离能垒均高于其相应的吸附能,即H-2在氧空位表面难以解离.对于预覆盖的氧表面,H2以侧吸附或端吸附方式吸附在OSUF位时为解离吸附,其中一个H仍吸附在OSUF位,另一个H吸附在相邻的预覆盖氧位;同时,以侧吸附方式吸附在Opre位时也为解离吸附.因此,H-2主要以解离吸附的形式存在于完整和预覆盖的氧表面上,而H-2主要以分子吸附的形式存在于氧空位表面上,表明H-2在CuO(111)表面的吸附和活化行为对表面结构特别敏感. (C)2016爱思唯尔B. V.保留所有权利。
Using density functional theory (DFT) calculations, the interactions of H and H-2 with different types of CuO(111) surfaces, including the perfect, oxygen-vacancy and pre-covered oxygen surfaces, have been systematically investigated to probe into the effect of surface structures on H-2 adsorption and activation. Our results show that the outermost surface oxygen site (O-SUF) is the active center for H adsorption both on the perfect and oxygen-vacancy surfaces, while H favorably adsorbs at the pre-covered oxygen site (O-pre) on the pre-covered oxygen CuO(111) surface. In the case of H-2 adsorption and activation, H-2 is the dissociative adsorption on the perfect surface, two dissociative H atoms adsorbed at the same OSUF site pull out the OSUF atom from the surface to form a H2O molecule adsorbed at the subsurface copper site (Cu-SUB), which ultimately contributes to the formation of oxygen-vacancy site on CuO(111) surface. For the oxygen-vacancy surface, H-2 adsorbed at the singly (Cu-1) and doubly (Cu-2) coordinated CuSUB sites via the side-on mode are two favorable configurations, moreover, the dissociation barriers for these two favorable configurations is higher than their corresponding adsorption energies, namely, H-2 dissociation is difficult to occur on the oxygen-vacancy surface. For the pre-covered oxygen surface, H-2 initially adsorbed at OSUF site with the side-on or end-on modes is the dissociative adsorption, in which one H is still adsorbed at OSUF site, the other H is adsorbed at the adjacent pre-covered oxygen site; meanwhile, H-2 initially adsorbed at Opre site with the side-on mode is also the dissociative adsorption. Thus, H-2 dominantly exists in the form of the dissociative adsorption with the adsorbed H atoms on the perfect and pre-covered oxygen surfaces, whereas, H-2 mainly exists in the form of molecular adsorption H-2 on the oxygen-vacancy surface, suggesting that the adsorption and activation behaviors of H-2 over CuO(111) surface are particularly sensitive to the surface structure. (C) 2016 Elsevier B.V. All rights reserved.