MACHINING OXIDE THIN-FILMS WITH AN ATOMIC FORCE MICROSCOPE - PATTERN AND OBJECT FORMATION ON THE NANOMETER SCALE
MACHINING OXIDE THIN-FILMS WITH AN ATOMIC FORCE MICROSCOPE - PATTERN AND OBJECT FORMATION ON THE NANOMETER SCALE
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DOI：
10.1126/science.257.5068.375
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发表时间：
1992-07-17
期刊：
影响因子：
56.9
通讯作者：
LIEBER, CM
中科院分区：
文献类型：
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作者：
KIM, Y;LIEBER, CM
原子力显微镜（AFM）已被用来机加工复杂的图案，并形成自由的结构物体在MoS2的表面上生长的MoO3薄层。AFM针尖可以以小于或等于10纳米的分辨率图案化线，然后通过控制施加的负载来成像所得到的结构而不受扰动。不同的MoO3结构也可以通过AFM加工来定义，而且这些物体可以用AFM针尖在MoS2衬底表面上进行操纵。这些结果表明，纳米级衍射光栅，高分辨率光刻掩模，并可能与新的性能纳米结构的组装应用。
An atomic force microscope (AFM) has been used to machine complex patterns and to form free structural objects in thin layers of MoO3 grown on the surface of MoS2. The AFM tip can pattern lines with less-than-or-equal-to 10-nanometer resolution and then image the resulting structure without perturbation by controlling the applied load. Distinct MoO3 structures can also be defined by AFM machining, and furthermore these objects can be manipulated on the MoS2 substrate surface with the AFM tip. These results suggest application to nanometer-scale diffraction gratings, high-resolution lithography masks, and possibly the assembly of nano-structures with novel properties.