Wetting Modification by Photocatalysis: A Hands-on Activity To Demonstrate Photoactivated Reactions at Semiconductor Surfaces
Wetting Modification by Photocatalysis: A Hands-on Activity To Demonstrate Photoactivated Reactions at Semiconductor Surfaces
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DOI：
10.1021/acs.jchemed.8b00362
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发表时间：
2018-09
影响因子：
3
通讯作者：
L. Rimoldi;T. Taroni;D. Meroni
中科院分区：
文献类型：
--
作者：
L. Rimoldi;T. Taroni;D. Meroni
We present a hands-on activity designed for advanced physical chemistry courses for Master’s students on the application of photocatalysis to the modification of the surface properties of a semiconductor (titanium dioxide). The wetting properties of TiO2 films, deposited from commercial powders, are studied before and after UV irradiation. Irradiation-induced superhydrophilicity is exploited to provide antifogging properties. The TiO2 films are then functionalized with a perfluorinated alkylsilane to impart superhydrophobicity and subsequently lithographed by irradiation through a photomask: the photocatalytic degradation of the organic chains in the irradiated areas leads to a wetting contrast that can be revealed using dye solutions. This experience can be easily adapted to be suited for undergraduates or high-school students as well as to demonstrations for science festivals.
