Temperature dependence of laser-induced damage threshold in silica glass
Temperature dependence of laser-induced damage threshold in silica glass
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DOI：
10.1088/1742-6596/244/3/032023
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发表时间：
2010-08
期刊：
影响因子：
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通讯作者：
K. Mikami;S. Motokoshi;M. Fujita;T. Jitsuno;J. Kawanaka;R. Yasuhara
中科院分区：
文献类型：
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作者：
K. Mikami;S. Motokoshi;M. Fujita;T. Jitsuno;J. Kawanaka;R. Yasuhara
测量了Nd：YAG激光基波（波长1064 nm）和三次谐波（波长355 nm）4 ns脉冲在不同温度条件（123 K - 473 K）下石英玻璃的激光损伤阈值。结果表明，低温下，损伤阈值增大。在1064 nm处，杂质浓度的温度依赖性变得很强。而在355 nm处，不同杂质浓度的样品的温度依赖性几乎相同。
The laser-induced damage thresholds in silica glasses at different temperature conditions (123 K – 473 K) by Nd:YAG laser fundamental (wavelength 1064 nm) and third harmonic (wavelength 355 nm) 4 ns of pulses were measured. In the results, the damage thresholds increased at low temperature. At 1064 nm, the temperature dependence became strong by the concentration of impurities. However, at 355 nm, the temperature dependences of almost sample were almost the same for different concentration of impurities.