Incorporation of Hydrogen in Carbon-Tungsten Co-Deposition Layers Formed by Hydrogen Plasma Sputtering
Incorporation of Hydrogen in Carbon-Tungsten Co-Deposition Layers Formed by Hydrogen Plasma Sputtering
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DOI：
10.13182/fst07-a1561
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发表时间：
2007-10
影响因子：
0.9
通讯作者：
K. Katayama;T. Okamura;K. Imaoka;Makoto Sasaki;Y. Uchida;M. Nishikawa;S. Fukada
中科院分区：
文献类型：
--
作者：
K. Katayama;T. Okamura;K. Imaoka;Makoto Sasaki;Y. Uchida;M. Nishikawa;S. Fukada
摘要ITER偏滤器区采用碳基材料和钨作为面向等离子体的材料。据推测，碳钨混合材料将在真空容器的内部组件的表面上形成。因此，有必要了解氢在碳钨混合材料中的掺入现象。在这项研究中，碳钨共沉积层形成溅射方法使用氢RF等离子体。氢掺入作为一个功能的碳和钨的原子比中所包含的层进行了研究。所获得的氢保持率以H/（C+W）计在0.16和0.83之间的范围内。没有观察到碳比对氢掺入的依赖性。据发现，结合的氢的释放行为的变化取决于层中的C和W的原子比。
Abstract Carbon based material and tungsten are used in ITER as plasma facing materials in the divertor region. Presumably, carbon-tungsten mixed materials will be formed on the surface of the inner components of the vacuum vessel. Therefore, it is necessary to understand incorporation phenomena of hydrogen into carbon-tungsten mixed materials. In this study, carbon-tungsten co-deposition layers were formed by sputtering method using hydrogen RF plasma. Hydrogen incorporation was investigated as a function of atomic ratio of carbon and tungsten contained in the layer. The obtained hydrogen retention was in the range between 0.16 and 0.83 as H/(C+W). The carbon ratio dependence on hydrogen incorporation was not observed. It was found that the release behavior of the incorporated hydrogen changes depending on the atomic ratio of C and W in the layer.