The effect of annealing on structural and optical properties of ZnO thin films grown by pulsed filtered cathodic vacuum arc deposition
The effect of annealing on structural and optical properties of ZnO thin films grown by pulsed filtered cathodic vacuum arc deposition
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DOI：
10.1088/0953-8984/18/27/021
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发表时间：
2006-06
期刊：
影响因子：
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通讯作者：
E. Şenadim;H. Kavak;R. Esen
中科院分区：
文献类型：
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作者：
E. Şenadim;H. Kavak;R. Esen
采用脉冲过滤阴极真空电弧沉积系统，在玻璃衬底上室温沉积了氧化锌薄膜。用X射线衍射仪研究了薄膜的晶体结构和微晶尺寸。测量结果表明，薄膜均为纤锌矿结构，沿(002)晶面择优取向生长，晶粒度约为18.9-42 nm。经退火处理后，微晶尺寸增大，X射线衍射图锐化。用紫外可见光谱仪和包络法计算研究了氧化锌薄膜的光学性质。退火后薄膜的吸收系数和光学带隙增大，折射率降低。从光学性质来看，脉冲阴极真空弧法在玻璃衬底上生长的氧化锌薄膜的最佳退火温度为600℃。由于玻璃的性质，这一温度是玻璃基板样品所能测量到的最高温度。
Thin ZnO films were deposited at room temperature on glass substrates by a pulsed filtered cathodic vacuum arc deposition system. The crystallographic structure and the size of the crystallites in the films were studied by means of x-ray diffraction. These measurements show that all the films are crystallized in the wurtzite form, present in a preferred orientation along the (002) direction, and the grain size is estimated to be 18.9–42 nm. The crystallite sizes were found to increase and the x-ray diffraction patterns were sharpened by annealing. Optical properties of the ZnO films were studied using a UV–visible spectrometer and calculations made using the envelope method. The absorption coefficient and optical band gap of the films were increased while the refractive index was decreased by annealing. The best annealing temperature for pulsed cathodic vacuum arc deposition grown ZnO thin films on glass substrates was found to be 600 °C from optical properties. This temperature is as high as can be measured for glass substrates samples because of the glass properties.