Magnetic anisotropy in a permalloy microgrid fabricated by near-field optical lithography
Magnetic anisotropy in a permalloy microgrid fabricated by near-field optical lithography
复制标题
近场光学光刻制造的坡莫合金微网格中的磁各向异性
DOI：
10.1063/1.1379048
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发表时间：
2001
影响因子：
3.2
通讯作者：
J. Bland
中科院分区：
文献类型：
--
作者：
S. Li;A. Lebib;D. Peyrade;M. Natali;Yong Chen;W. Lew;J. Bland
我们报告的制造和磁性能的坡莫合金微网格制备的近场光学光刻和其特征在于使用高灵敏度的磁光克尔效应技术。一个四重磁各向异性诱导的网格架构被确定。
We report the fabrication and magnetic properties of permalloy microgrids prepared by near-field optical lithography and characterized using high-sensitivity magneto-optical Kerr effect techniques. A fourfold magnetic anisotropy induced by the grid architecture is identified.