Ocular artifacts in EEG and event-related potentials I: Scalp topography
Ocular artifacts in EEG and event-related potentials I: Scalp topography
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DOI：
10.1007/bf01234127
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发表时间：
1993-01-01
期刊：
影响因子：
2.7
通讯作者：
Scherg, Michael
中科院分区：
文献类型：
--
作者：
Lins, Otavio G.;Picton, Terence W.;Scherg, Michael
污染脑电图的眼部伪影来自角膜和眼底之间的电位差。这个角膜基底或角膜视网膜电位可以被认为是一个等效的偶极子，其正极指向角膜。角膜相对于前额显示稳定的直流电位，约为+13 mV。眨眼电位是由眼睑在带正电的角膜上向下滑动引起的。眼球运动产生的伪影是由角膜基底电位方向的改变引起的。眼部伪影的头皮分布可以用传播因子来描述，传播因子是眼周电极记录在特定头皮位置的EOG信号的比例。这些因素随头皮电极的位置而变化。眨眼和眼球向上运动的传播因子有显著差异。
The ocular artifacts that contaminate the EEG derive from the potential difference between the cornea and the fundus of the eye. This corneofundal or corneoretinal potential can be considered as an equivalent dipole with its positive pole directed toward the cornea. The cornea shows a steady DC potential of approximately +13 mV relative to the forehead. Blink potentials are caused by the eyelids sliding down over the positively charged cornea. The artifacts from eye-movements result from changes in orientation of the corneo-fundal potential. The scalp-distribution of the ocular artifacts can be described in terms of propagation factors - the fraction of the EOG signal at periocular electrodes that is recorded at a particular scalp location. These factors vary with the location of the scalp electrode. Propagation factors for blinks and upward eye-movements are significantly different.