Ultrathin AAO Membrane as a Generic Template for Sub-100 nm Nanostructure Fabrication
Ultrathin AAO Membrane as a Generic Template for Sub-100 nm Nanostructure Fabrication
复制标题
DOI：
10.1021/acs.chemmater.6b00722
复制
发表时间：
2016-07-12
影响因子：
8.6
通讯作者：
Thomann, Isabell
中科院分区：
文献类型：
--
作者：
Robatjazi, Hossein;Bahauddin, Shah Mohammad;Thomann, Isabell
阳极氧化铝 (AAO) 模板正在成为一种平台，用于对规则纳米结构阵列进行简单、经济高效、高通量、自上而下的纳米加工。然而，到目前为止，AAO 图案转移很大程度上仅限于光滑且化学惰性的表面，主要是硅基板。在这里，我们提出了一种更通用的策略，用于制备独立式通孔超薄氧化铝膜（UTAM）并将其转移到光滑和粗糙的基材上，从而能够在几乎任意基材上制造特征直径低于 100 nm 的厘米级纳米结构阵列。为了验证我们的程序的实用性，我们将 UTAM 转移到与光催化应用相关的表面，并在化学非惰性 NiOx 薄膜顶部制备了由尺寸控制的亚 100 nm Au 和 Ni 纳米点的密集阵列组成的等离子体光电阴极。为了演示所制造结构的功能，我们使用由 NiOx/Al 基板上的亚 50 nm Au 纳米点阵列组成的等离子体光电阴极来驱动直接等离子体增强光电催化，并发现了出色的器件性能。我们还成功地用一系列高密度亚 100 nm 纳米点阵列装饰了非常粗糙的氟掺杂氧化锡基板。我们的结果扩展了 AAO 掩模作为新颖应用的通用模板的机会，而这些应用以前因缺乏转移到所需基材的方法而被禁止。
Anodic aluminum oxide (AAO) templates are emerging as a platform for simple, cost-effective, high-throughput top-down nanofabrication of regular arrays of nanostructures. Thus far, however, AAO pattern transfer has largely been restricted to smooth and chemically inert surfaces, mostly Silicon substrates. Here, we present a more generalizable strategy for preparing free-standing through-hole ultrathin alumina membranes (UTAMs) and transferring them to both smooth and rough substrates, thereby enabling the fabrication of centimeter-scale arrays of nanostructures with sub-100 nm feature diameters on almost arbitrary substrates. To validate the utility of our procedures, we transferred UTAMs to surfaces relevant for photocatalytic applications and prepared plasmonic photocathodes consisting of dense arrays of size-controlled sub-100 nm Au and Ni nanodots on top of chemically noninert NiOx thin films. To demonstrate the functionality of the fabricated structures, we used a plasmonic photocathode consisting of an array of sub-50 nm Au nanodots on NiOx/Al substrates to drive direct, plasmon-enhanced photoelectrocatalysis and found excellent device performance. We also successfully decorated very rough fluorine-doped tin oxide substrates with an array of high-density sub-100 nm nanodots. Our results extend the opportunities for AAO masks to serve as generic templates for novel applications that were previously prohibited by lack of methods to transfer to the required substrate.