Fabrication of mesoscopic superconducting Nb wires using conventional electron-beam lithographic techniques
Fabrication of mesoscopic superconducting Nb wires using conventional electron-beam lithographic techniques
复制标题
使用传统电子束光刻技术制造介观超导铌线
DOI：
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发表时间：
2001
期刊：
影响因子：
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通讯作者：
J. Pekola
中科院分区：
文献类型：
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作者：
N. Kim;K. Hansen;J. Toppari;T. Suppula;J. Pekola
传统的电子束光刻已被用于制造介观Nb线。Nb是用电子枪加热在真空蒸发室中沉积的。典型的线宽和厚度分别为200和50 nm。转变温度在7 K以上。它们随厚度和线宽的增加而增加。为了证明两个角度蒸发技术的可行性，我们还制作了Nb/（Al-）AlOx/Nb隧道结显示超导单电子晶体管的特性。
Conventional electron-beam lithography has been used to fabricate mesoscopic Nb wires. Nb was deposited in an ultrahigh vacuum evaporation chamber using electron gun heating. The typical linewidth and the thickness were 200 and 50 nm, respectively. The transition temperatures were above 7 K. They increased with thickness and linewidth. To demonstrate the feasibility of two angle evaporation techniques, we also fabricated Nb/(Al–)AlOx/Nb tunnel junctions showing superconducting single-electron transistor characteristics.