Variations in cephalic vein venography for device implantation–Relationship to success rate of lead implantation
Variations in cephalic vein venography for device implantation–Relationship to success rate of lead implantation
复制标题
装置植入头静脉静脉造影的变化——与导线植入成功率的关系
DOI:
10.1016/j.joa.2012.05.009
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发表时间:
2013
期刊:
影响因子:
--
通讯作者:
H. Daida
中科院分区:
文献类型:
--
作者:
T. Tokano;Y. Nakazato;Tomoyuki Shiozawa;H. Konishi;M. Hiki;Y. Kato;Sayaka Komatsu;Miki Yamase;Kaoru Komatsu;Hidemori Hayashi;G. Sekita;S. Suwa;F. Bito;K. Kizu;M. Sumiyoshi;H. Daida
IntroductionLead implantation using the cephalic vein (CV) cutdown technique has been well established, but is not always expected to achieve high success rates. We studied the relationship between preoperative CV venography and the success rate of lead implantation.MethodsTwo hundred and twenty one CV venographies were performed in 205 patients (mean age 75 years, 113 males). Leads were inserted via the CV cutdown technique with a guidewire and sheath. Variations in CV venography included usage of the right and left CVs. The success rate of lead implantation was studied.ResultsNo major kink was observed in 71% of the right CV cases and 43% of the left CV cases. Leads were successfully implanted in over 90% of these patients. A major kink in the CV was found in 15% of the right CV cases and 34% of the left CV cases and successful lead implantation was around 80% in this population. The overall success rate tended to be higher for the right side (83%) than for the left side (71%).ConclusionSevere kinks or variations in the CV that hinder lead manipulation were less frequent in the right CV. Therefore, a higher success rate of lead implantation by the cutdown technique is expected for the right CV.