Fabrication and testing of hard x‐ray sputtered‐sliced zone plate
Fabrication and testing of hard x‐ray sputtered‐sliced zone plate
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硬X射线溅射切片波带片的制作与测试
DOI：
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发表时间：
1995
期刊：
影响因子：
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通讯作者：
H. Kihara
中科院分区：
文献类型：
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作者：
N. Kamijo;S. Tamura;Yoshio Suzuki;H. Kihara
用物理气相沉积的方法，在直径50μm的金丝芯上交替沉积透明和不透明层，制成了溅射切片硬X射线波带片。波带板的设计焦距为124 mm，工作电压为8.05 eV，由25对交替的Ag和C层组成，沿导线轴线的厚度为∼40μm。利用能量为8.05keV的单色化同步加速器X射线，一阶焦束的最小焦斑尺寸在垂直方向和水平方向上分别为2.3μm。测得聚光效率为∼4%。得到的焦斑尺寸明显大于从光源尺寸矛盾预测的1.2μmφ的空间分辨率。
A sputtered‐sliced hard x‐ray zone plate has been made by the physical vapor deposition of alternating transparent and opaque layers onto a fine gold wire core of 50 μm diameter. The zone plate is designed to operate with a focal length of 124 mm at 8.05 eV and consists of 25 pairs of alternating Ag and C layers with a thickness of ∼40 μm along the wire axis. Using monochromized synchrotron x ray with an energy of 8.05 keV the minimum focal spot size attained for the first order focal beam was 2.3 μm in the vertical and horizontal directions, respectively. The light‐collecting efficiency was determined to be ∼4%. The focal spot size obtained was substantially larger than the 1.2 μm φ spatial resolution predicted from the contradiction of the light source size.