Ultraviolet-nanoimprint of 40 nm scale patterns using functionally modified fluorinated hybrid materials
Ultraviolet-nanoimprint of 40 nm scale patterns using functionally modified fluorinated hybrid materials
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使用功能改性氟化混合材料的 40 nm 尺度图案的紫外纳米压印
DOI：
10.1088/0957-4484/17/13/040
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发表时间：
2006
期刊：
影响因子：
3.5
通讯作者：
B. Bae
中科院分区：
文献类型：
--
作者：
W. Kim;D. Choi;B. Bae
可光固化的氟化有机-无机杂化材料（F-杂化物）呈现高模量、低表面张力、低收缩和高耐蚀刻性。这些是作为模具和作为用于纳米压印光刻（NIL）的抗蚀剂的基本性质。为了控制氟化混合物的性能，在本研究中，它是通过最佳添加适当的丙烯酰基单体作为模具和作为抗蚀剂材料的NIL的修改。因此，调制抗蚀剂材料的粘度和模具材料的模量（低v F-混合物和柔性F-混合物）。最后，使用相同改性的F-杂化材料系统作为模具和抗蚀剂，压印30-40 nm半间距线图案。
Photo-curable fluorinated organic–inorganic hybrid materials (F-hybrimers) present high modulus, low surface tension, low shrinkage, and high etching resistance. These are essential properties as a mould and as a resist for nanoimprint lithography (NIL). In order to control the properties of the fluorinated hybrimer, in this study it is modified by the optimal addition of appropriate acryl monomers as a mould and as a resist material for NIL. Accordingly, the viscosity in terms of the resist material and the modulus in terms of the mould material are modulated (low v F-hybrimer and flexible F-hybrimer). Finally, 30–40 nm half-pitch line patterns are imprinted, using identically modified F-hybrimer material systems as a mould and a resist.