Peripheral and central delay in processing high spatial frequencies: reaction time and VEP latency studies

Peripheral and central delay in processing high spatial frequencies: reaction time and VEP latency studies
复制标题

DOI:
10.1016/s0042-6989(98)00165-5
复制
发表时间:
1999-02-01
期刊:
影响因子:
1.8
通讯作者:
Vassilev, A
Vassilev, A
中科院分区:
心理学3区
文献类型:
--
作者:
Mihaylova, M;Stomonyakov, V;Vassilev, A

文献摘要

被引文献

相似文献

正弦光栅刺激下记录视觉诱发电位(VEP)和反应时(RT)。栅格空间频率(SF)分别为0.5、5或12ed,并改变栅格对比度。与前人的研究结果一致,VEP潜伏期和反应时都随着栅格SF的增加和栅格对比度的降低而增加。此外,当SF从0.5ed增加到5ed时,RT和VEP潜伏期增加了大致相同的量,这表明与0.5ed时的RT相比,5ed时RT延迟的主要来源是外周起源。然而,与0.5d和5d的数据相比,12d的RT增加的幅度远远大于VEP潜伏期。我们得出结论,在高SF时,RT延迟除了外围延迟之外,还包括相当大的中心分量。(C)1998爱思唯尔科学有限公司。保留所有权利。
Visually evoked potentials (VEP) and reaction time (RT) were recorded under stimulation with sinusoidal gratings. Grating spatial frequency (SF) was 0.5, 5 or 12 ed and grating contrast was varied. Consistent with previous findings, both VEP latency and RT increased with the increase of grating SF and with the decrease of grating contrast. It was found, in addition, that RT and VEP latency increased by approximately the same amount when SF increased from 0.5 to 5 ed, thus suggesting that the main source of the RT delay at 5 ed in comparison with RT at 0.5 ed is of peripheral origin. However, in comparison with the data at 0.5 and 5 ed, RT at 12 ed increased much more than VEP latency. We conclude that the RT delay at high SF involves a substantial central component in addition to the peripheral delay. (C) 1998 Elsevier Science Ltd. All rights reserved.