Synchrotron X-ray Photoelectron Spectroscopy Study of Electronic Changes at the ZnO Surface Following Aryldiazonium Ion Grafting: A Metal-to-Insulator Transition
Synchrotron X-ray Photoelectron Spectroscopy Study of Electronic Changes at the ZnO Surface Following Aryldiazonium Ion Grafting: A Metal-to-Insulator Transition
复制标题
芳基重氮离子接枝后 ZnO 表面电子变化的同步辐射 X 射线光电子能谱研究:金属到绝缘体的转变
DOI:
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发表时间:
2018
期刊:
影响因子:
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通讯作者:
M. Allen
中科院分区:
文献类型:
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作者:
A. R. McNeill;Kalib J. Bell;A. R. Hyndman;R. M. Gazoni;R. Reeves;A. Downard;M. Allen
ZnO is a member of a small class of semiconductors that includes In2O3, SnO2, CdO, and InN, whose surfaces are highly unusual because their electronic bands bend downward to form a quantized potential well in which a two-dimensional electron gas is confined. At the O-polar ZnO(0001) surface, this effect arises from the adsorption of H adatoms which produces a hydroxyl-terminated surface. In this work, we investigate the effect of covalently anchored organic layers on the band bending at ZnO(0001) surfaces. We use aryldiazonium salt electrochemistry to deposit 4–5 nm thick layers of 4-nitrophenyl (NP) and 4-(trifluoromethyl)phenyl (TFMP) groups. Synchrotron X-ray photoelectron spectroscopy (XPS) showed that both NP and TFMP modifications permanently removed the downward band bending at the ZnO surface. This behavior can be explained by the direct covalent bonding of the aryl groups to the surface, also revealed by XPS analysis, and the electron-withdrawing character of both modifiers. Surprisingly, the i...