Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition
Validating optical emission spectroscopy as a diagnostic of microwave activated CH4/Ar/H2 plasmas used for diamond chemical vapor deposition
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DOI：
10.1063/1.3078032
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发表时间：
2009-02
影响因子：
3.2
通讯作者：
Jie Ma;M. Ashfold;Y. Mankelevich
中科院分区：
文献类型：
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作者：
Jie Ma;M. Ashfold;Y. Mankelevich
空间分辨发射光谱（OES）已被用于研究在中等功率密度（≤ 30 W cm-3）和压力（≤175 Torr）下操作的微波激活的CH 4/Ar/H2等离子体中的气相化学和组成，在多晶金刚石的化学气相沉积期间。几种示踪剂物种进行监测，以获得有关等离子体的信息。用光化法测定了基态H（n=1）原子的相对浓度，并证明了该方法在本实验条件下的有效性。电子激发的H（n=3和4）原子，Ar（4p）原子，和C2和CH自由基也进行了研究，通过监测它们的排放量作为工艺参数（Ar和CH 4流量，输入功率和压力）的函数和基板上方的距离。这些不同的物种表现出不同的行为，反映了它们不同的形成机制。OES确定的相对趋势被发现是在非常好的协议与那些…
Spatially resolved optical emission spectroscopy (OES) has been used to investigate the gas phase chemistry and composition in a microwave activated CH4/Ar/H2 plasma operating at moderate power densities (∼30 W cm−3) and pressures (≤175 Torr) during chemical vapor deposition of polycrystalline diamond. Several tracer species are monitored in order to gain information about the plasma. Relative concentrations of ground state H (n=1) atoms have been determined by actinometry, and the validity of this method have been demonstrated for the present experimental conditions. Electronically excited H (n=3 and 4) atoms, Ar (4p) atoms, and C2 and CH radicals have been studied also, by monitoring their emissions as functions of process parameters (Ar and CH4 flow rates, input power, and pressure) and of distance above the substrate. These various species exhibit distinctive behaviors, reflecting their different formation mechanisms. Relative trends identified by OES are found to be in very good agreement with those ...