Fracture toughness of the interface between CVD diamond film and silicon substrate in the relation with methane concentration in the source gas mixture

Fracture toughness of the interface between CVD diamond film and silicon substrate in the relation with methane concentration in the source gas mixture
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CVD金刚石膜与硅基体界面断裂韧性与源气体混合物中甲烷浓度的关系

DOI:
10.1016/s0925-9635(00)00608-7
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发表时间:
2001
影响因子:
4.1
通讯作者:
H. Abé
H. Abé
中科院分区:
材料科学2区
文献类型:
--
作者:
Hironori Takahashi;S. Kamiya;M. Saka;H. Abé

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