Adhesion of Ti and TiC Coatings on PMMA Subject to Plasma Treatment: Effect of Intermediate Layers of Al2O3 and TiO2 Deposited by Atomic Layer Deposition
Adhesion of Ti and TiC Coatings on PMMA Subject to Plasma Treatment: Effect of Intermediate Layers of Al2O3 and TiO2 Deposited by Atomic Layer Deposition
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DOI：
10.1002/ppap.200900038
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发表时间：
2009-10-14
影响因子：
3.5
通讯作者：
Tanttari, Mari
中科院分区：
文献类型：
--
作者：
Kaariainen, Tommi O.;Cameron, David C.;Tanttari, Mari
磁控溅射金属和金属化合物薄膜通常显示出对PMMA的非常差的粘附性;这限制了聚合物用于耐磨或耐刮擦或具有装饰性表面的部件。我们已经表明，附着力可以显着改善的双重过程中，纳米级厚度的TiO 2或Al 2 O3的粘附层，通过低温原子层沉积（AID）之前，磁控溅射沉积。用于TiO 2和Al 2 O3的金属前体分别是TDMAT和TMA，并且在这两种工艺中使用臭氧作为氧源。在该过程之后，使用脉冲DC反应磁控溅射沉积金属/金属碳化物层。在AID粘附层的存在下，拉脱粘附强度随着其厚度增加，直到失效机制是由于基底材料本身的内聚破坏的点。已经表明，ALD沉积层通过阻挡紫外线辐射对聚合物结构的直接离子损伤和破坏来保护PMMA免受溅射过程期间的等离子体损伤。
Magnetron sputtered metal and metal compound films generally show very poor adhesion to PMMA; this limits the use of the polymer for components which are wear or scratch resistant or have a decorative finish. We have shown that adhesion could be significantly improved by a duplex process where a nanometer-scale thickness adhesion layer of TiO2 or Al2O3 was deposited by low temperature atomic layer deposition (AID) prior to magnetron sputtering. The metal precursors used for TiO2 and Al2O3 were TDMAT and TMA, respectively, and ozone was used as a source of oxygen in both processes. This process was followed by deposition of the metal/metal carbide layer using pulsed DC reactive magnetron sputtering. With the presence of the AID adhesion layer, the pull-off adhesion strength increased with its thickness until a point where the failure mechanism was due to cohesive disruption of the substrate material itself. It has been shown that the ALD deposited layers protect the PMMA against plasma damage during the sputtering process by blocking both direct ion damage and disruption of the polymer structure by ultra-violet radiation.