Surface electronic structure of Re(0001): A spin-resolved photoemission study
Surface electronic structure of Re(0001): A spin-resolved photoemission study
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Re(0001) 的表面电子结构:自旋分辨光电发射研究
DOI:
10.1103/physrevb.107.165420
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发表时间:
2023
影响因子:
3.7
通讯作者:
and Markus Donath
中科院分区:
文献类型:
--
作者:
Marcel Holtmann;Peter Kruger;Koji Miyamoto;Taichi Okuda;Kenya Shimada;and Markus Donath
The surface electronic structure of Re(0001) has been investigated in a combined experimental and theoretical study. Spin- and angle-resolved photoemission was employed to unravel the spin-dependentdispersion of electronic states along theanddirections. The results are compared with band-structure calculations based on density-functional theory. Additional calculations include transitions into final states by taking into account the corresponding matrix elements. Recently, Shockley- and Tamm-type surface states close towere identified, which were found to be mixed by spin-orbit coupling. Here, we determined the Rashba parameterof the surface state aroundto 0.32 and 0.34eVA˚ alongand, respectively. Furthermore, we extend our analysis to a widerrange revealing a multitude of electronic states along both high-symmetry directions. In particular, Rashba-type spin splittings are observed around the high-symmetryandpoints. At variance with theoretical predictions for a perfect hcp(0001) surface, we do not find any out-of-plane spin polarization. This is caused by monatomic steps of a real Re(0001) surface with alternating terminations, leading on average to an effective sixfold surface symmetry and vanishing net out-of-plane spin polarization.
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影响因子:
1.9
作者:
Ouazi, S.;Pohlmann, T.;Wiesendanger, R.
通讯作者:
Wiesendanger, R.
DOI:
10.1088/0953-8984/15/3/201
发表时间:
2003
期刊:
Journal of Physics: Condensed Matter
影响因子:
--
作者:
R. D. Diehl;J. Ledieu;N. Ferralis;A. Szmodis;R. McGrath
通讯作者:
R. McGrath
影响因子:
3.3
作者:
H. Mirhosseini;M. Flieger;J. Henk
通讯作者:
J. Henk
DOI:
--
发表时间:
2019
期刊:
影响因子:
--
作者:
Hitoshi Saito;Jieran Chen;Junpei Kuwabara;Takeshi Yasuda and Takaki Kanbara;Norihiko Nishizawa;Hitoki Yoneda;T. Okuda
通讯作者:
T. Okuda
影响因子:
1.9
作者:
A. Urru;A. D. Corso
通讯作者:
A. D. Corso