Martensitic transformation and shape memory behavior in sputter-deposited TiNi-base thin films
Martensitic transformation and shape memory behavior in sputter-deposited TiNi-base thin films
复制标题
DOI：
10.1016/s0921-5093(99)00292-0
复制
发表时间：
1999-12-15
期刊：
影响因子：
6.4
通讯作者：
Ishida, A
中科院分区：
文献类型：
--
作者：
Miyazaki, S;Ishida, A
自1990年以来，Ti-Ni和Ti-Ni-X(X=Cu.用溅射法制备了Pd，Hf)薄膜。溅射沉积TiNi基形状记忆合金薄膜的动机源于对驱动微机械的大功率微驱动器的巨大需求，因为在众多驱动器材料中，形状记忆合金的驱动力和位移最大。在溅射沉积的Ti-Ni薄膜中获得了稳定的形状记忆效应和相当于大块合金的超弹性。Ti-Ni-Cu和Ti-Ni-(Pd或Hf)薄膜的相变温度滞后较窄，相变温度较高。同时，在非晶态条件下经相当低的温度退火制备的富钛钛镍薄膜中，发现了由非平衡纳米析出物和非平衡成分组成的独特的微结构。人们已经提出了几种微机械加工工艺来制作一些利用钛镍薄膜制作微驱动器的原型。本文综述了溅射沉积TiNi基形状记忆合金薄膜的研究进展。(C)1999 Elsevier Science S.A.保留所有权利。
Since 1990, Ti-Ni and Ti-Ni-X (X = Cu. Pd, Hf) thin films have been made by sputtering. The motivation for fabricating sputter-deposited TiNi-base shape memory alloy thin films originates from the great demand for the development of powerful microactuators which can drive micromachines, because actuation force and displacement are greatest in shape memory alloys amongst many actuator materials. Stable shape memory effect and superelasticity, which are equivalent to those of bulk alloys, have been achieved in the sputter-deposited Ti-Ni thin films. Narrow transformation temperature hysteresis and high transformation temperatures were also achieved in Ti-Ni-Cu and Ti-Ni-(Pd or Hf) thin films, respectively. In the meantime, unique microstructures consisting of nonequilibrium nanoscale precipitates and nonequilibrium compositions in the matrix have been found in Ti-rich Ti-Ni thin films which were fabricated from amorphous condition by annealing at a considerably low temperature. Several micromachining processes have been proposed to fabricate some prototypes of microactuators utilizing Ti-Ni thin films. The present paper will review the recent development of the above mentioned topics relating to sputter-deposited TiNi-base shape memory alloy thin films. (C) 1999 Elsevier Science S.A. All rights reserved.