Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy
Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy
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DOI：
10.1063/1.361440
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发表时间：
1996-05
影响因子：
3.2
通讯作者：
Shi Xu;B. Tay;H. S. Tan;Li Zhong;Y. Tu;S. Silva;W. Milne
中科院分区：
文献类型：
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作者：
Shi Xu;B. Tay;H. S. Tan;Li Zhong;Y. Tu;S. Silva;W. Milne
离子能量由衬底偏压控制，是决定过滤阴极真空弧法沉积薄膜性能的重要参数。衬底偏压决定了生长物种的离子能量分布。在保持其他沉积条件不变的情况下，改变离子能量，以研究离子能量对薄膜性能的影响。利用椭偏仪、表面轮廓仪、光学光谱仪和纳米压痕仪对薄膜的光学和机械参数进行了表征。用电子能量损失谱和拉曼光谱对薄膜进行了结构分析。
Ion energy, controlled by the substrate bias, is an important parameter in determining properties of films deposited by the filtered cathodic vacuum arc technique. The substrate bias determines the ion energy distribution of the growth species. The ion energy is varied, while keeping the other deposition conditions constant, in order to study the effect of ion energy on the film properties. The films were characterized by their optical and mechanical parameters using an ellipsometer, surface profilometer, optical spectrometer, and nanoindenter. Electron energy‐loss spectroscopy and Raman spectroscopy were used for structural analysis of the films.