Resistive switching behaviors of ZnO nanorod layers
Resistive switching behaviors of ZnO nanorod layers
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DOI:
10.1063/1.3453450
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发表时间:
2010-06-14
影响因子:
4
通讯作者:
Wu, Tai-Bor
中科院分区:
文献类型:
--
作者:
Chang, Wen-Yuan;Lin, Chin-An;Wu, Tai-Bor
We have fabricated vertically aligned ZnO nanorod layers (NRLs) on indium tin oxide (ITO) electrodes using a hydrothermal process. The Pt/ZnO NRL/ITO capacitor exhibits bipolar resistive switching behavior. The resistive switching behavior may be related to the oxygen vacancies and/or zinc interstitials confined on the surface of the ZnO NRs, giving rise to the formation of straight and extensible conducting filaments along each vertically aligned ZnO NR. Superior stability in resistive switching characteristics was also observed, demonstrating that ZnO NRLs have the potential for next-generation nonvolatile memory applications. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3453450]