Redox-Controlled Reactivity at Boron: Parallels to Frustrated Lewis/Radical Pair Chemistry
Redox-Controlled Reactivity at Boron: Parallels to Frustrated Lewis/Radical Pair Chemistry
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硼的氧化还原控制反应性:与受挫的路易斯/自由基对化学相似
DOI:
10.1021/acs.inorgchem.0c01464
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发表时间:
2020
影响因子:
4.6
通讯作者:
Ménard, Gabriel
中科院分区:
文献类型:
--
作者:
Wong, Anthony;Chu, Jiaxiang;Wu, Guang;Telser, Joshua;Dobrovetsky, Roman;Ménard, Gabriel
We report the synthesis of new Lewis-acidic boranes tethered to redox-active vanadium centers, (Ph2N)3V(μ-N)B(C6F5)2(1a) and (N(CH2CH2N(C6F5))3)V(μ-N)B(C6F5)2(1b). Redox control of the VIV/Vcouple resulted in switchable borane versus “hidden” boron radical reactivity, mimicking frustrated Lewis versus frustrated radical pair (FLP/FRP) chemistry, respectively. Whereas heterolytic FLP-type addition reactions were observed with the VVcomplex (1b) in the presence of a bulky phosphine, homolytic peroxide, or Sn–hydride bond cleavage reactions were observed with the VIVcomplex, [CoCp2*][(N(CH2CH2N(C6F5))3)V(μ-N)B(C6F5)2] (3b), indicative of boron radical anion character. The extent of radical character was probed by spectroscopic and computational means. Together, these results demonstrate that control of the VIV/Voxidation states allows these compounds to access reactivity observed in both FLP and FRP chemistry.