Vacuum ultraviolet light assisted bonding and nanoscale pattern transfer method for polydimethylsiloxane
Vacuum ultraviolet light assisted bonding and nanoscale pattern transfer method for polydimethylsiloxane
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DOI：
10.1016/j.mee.2017.04.005
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发表时间：
2017-05-25
影响因子：
2.3
通讯作者：
Yamamoto, Takatoki
中科院分区：
文献类型：
--
作者：
Hashimoto, Yuki;Mogi, Katsuo;Yamamoto, Takatoki
本文描述了一种将纳米级图案从环烯烃聚合物（COP）模具转移到玻璃基板上的UV可固化聚二甲基硅氧烷（PDMS）表面的方法。首先通过旋涂和光固化将PDMS沉积在图案化模具上。真空紫外线（VUV）辐射然后用于活化PDMS和玻璃基板的表面，然后使它们接触。一旦形成粘合，就将COP模具剥离，在玻璃基板上留下图案化的PDMS。首先进行键合测试以确定形成永久键合的最佳VUV辐照剂量。然后通过转移周期性的纳米图案来证明所提出的方法的有效性。显微镜检查的原始和转移的模式显示，成功的复制实现。还进行了光谱分析，以澄清在键合过程中所涉及的机制。结果表明，真空紫外辐照引起的PDMS表面的氧化和OH基团的形成。当PDMS和玻璃基板接触时，发生脱水反应，导致两种材料之间形成硅氧烷（-O-Si-O-）键。所提出的方法提供了简单的优点，并允许非常精细的图案的无变形转移。它也可以应用于广泛的纳米级制造任务。(C)2017爱思唯尔B. V.保留所有权利。
This paper describes a method for transferring a nanoscale pattern from a cyclic olefin polymer (COP) mold to the surface of UV curable polydimetylsiloxane (PDMS) on a glass substrate. The PDMS is first deposited on the patterned mold by spin-coating and photocuring. Vacuum ultraviolet (VUV) radiation is then used to activate the surface of both the PDMS and the glass substrate before bringing them into contact. Once a bond has been formed, the COP mold is peeled away, leaving the patterned PDMS on the glass substrate. Bonding tests were first carried out to determine the optimum VUV irradiation dose to form a permanent bond. The effectiveness of the proposed method was then demonstrated by transferring a periodic nanoscale pattern. Microscopic examination of the original and transferred patterns revealed that successful reproduction was achieved. A spectroscopic analysis was also performed to clarify the mechanism involved in the bonding process. The results suggested that VUV irradiation caused oxidation of the PDMS surface and the formation of OH groups. When the PDMS and the glass substrate were brought into contact, a dehydration reaction took place which caused the formation of siloxane (-O-Si-O-) bonds between the two materials. The proposed method offers the advantages of being simple and allowing deformation-free transfer of very fine patterns. It can also be applied to a wide range of nanoscale fabrication tasks. (C) 2017 Elsevier B.V. All rights reserved.