Development and preparation of thin, supported targets and stripper foils☆
Development and preparation of thin, supported targets and stripper foils☆
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薄型支撑靶材和剥离箔的开发和制备☆
DOI：
10.1016/0168-9002(89)90129-0
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发表时间：
1989
期刊：
影响因子：
--
通讯作者：
J. R. Gibson
中科院分区：
文献类型：
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作者：
W. S. Aaron;M. Petek;L. Zevenbergen;J. R. Gibson
通常，希望制备自支撑的薄膜，以便任何外来的支撑材料不会干扰实验测量。然而，面密度非常低的薄膜、金属以外的薄膜或覆盖大面积的薄膜可能需要使用背衬或支撑物。同位素研究材料实验室（IRML）正在开发两类负载薄膜。氧化薄膜的电沉积是一种相当常见的靶材制备技术，通常在薄金属箔或低原子序数材料（如Be）以及较小程度上的C箔上进行。IRML开发的技术可以在碳箔或镀铝聚酯薄膜上电沉积高达500 μg/cm2的氧化膜。电沉积是一种非常有吸引力的目标制造方法，因为它在使用稀有和/或有价值的同位素方面非常有效。在碳或聚酯薄膜上制备这些薄膜的能力提供了一个目标，在大多数应用中，由背衬产生的干扰要小得多。碳、铝、硼和钛薄膜被用作剥离箔，用于产生能量为50 MeV或更高的中性（H−→H0）粒子束。中和剂箔的厚度为5 - 12 μg/cm2，由Al和C制成，厚度为25 cm × 25 cm，安装在透光率约为90%的薄镍网格上。更大的箔目前正在开发中。
Usually, it is desirable to prepare thin films that are self-supporting so that any extraneous support materials will not interfere with experimental measurements. However, films with very low areal densities, films other than metals or films covering large areas may require the use of a backing or support. Two classes of supported thin films are being developed by the Isotope Research Materials Laboratory (IRML). Electrodeposition of oxide thin films is a fairly common target preparation technique that is usually performed on backings such as thin metal foils or low atomic number materials like Be and to a lesser extent, C foils. Techniques have been developed by IRML that result in electrodeposition of oxide films up to 500 μg/cm2on carbon foils or aluminized mylar. Electrodeposition is a very attractive target fabrication method since it is very efficient in the usage of rare and/or valuable isotopes. The ability to prepare these films on carbon or mylar foils provides a target that has, in most applications, far less interference resulting from the backing. Thin films of carbon, aluminum, boron and titanium are being used as stripper foils in the generation of neutral (H−→ H0) particle beams with energies of 50 MeV or greater. Neutralizer foils as large as 25 cm × 25 cm have been pr from Al and C in thicknesses ranging from 5 to 12 μg/cm2that are mounted on thin nickel grids with a transmittance of approximately 90%. Significantly larger foils are currently under development.