Thermally Ultrarobust S = 1/2 Tetrazolinyl Radicals: Synthesis, Electronic Structure, Magnetism, and Nanoneedle Assemblies on Silicon Surface
Thermally Ultrarobust S = 1/2 Tetrazolinyl Radicals: Synthesis, Electronic Structure, Magnetism, and Nanoneedle Assemblies on Silicon Surface
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耐热超鲁棒 S = 1/2 四唑啉基自由基:硅表面上的合成、电子结构、磁性和纳米针组件
DOI:
10.1021/jacs.3c03402
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发表时间:
2023
影响因子:
15
通讯作者:
Rajca, Andrzej
中科院分区:
文献类型:
--
作者:
Yang, Zhimin;Pink, Maren;Nowik-Boltyk, Ewa Malgorzata;Lu, Shutian;Junghoefer, Tobias;Rajca, Suchada;Stoll, Stefan;Casu, Maria Benedetta;Rajca, Andrzej
Open-shell organic molecules, includingS= 1/2 radicals, may provide enhanced properties for several emerging technologies; however, relatively few synthesized to date possess robust thermal stability and processability. We report the synthesis ofS= 1/2 biphenylene-fused tetrazolinyl radicals1and2. Both radicals possess near-perfect planar structures based on their X-ray structures and density-functional theory (DFT) computations. Radical1possesses outstanding thermal stability as indicated by the onset of decomposition at 269 °C, based on thermogravimetric analysis (TGA) data. Both radicals possess very low oxidation potentials <0 V (vs. SCE) and their electrochemical energy gaps,Ecell≈ 0.9 eV, are rather low. Magnetic properties of polycrystalline1are characterized by superconducting quantum interference device (SQUID) magnetometry revealing a one-dimensionalS= 1/2 antiferromagnetic Heisenberg chain with exchange coupling constantJ′/k≈ −22.0 K. Radical1in toluene glass possesses a long electron spin coherence time,Tm≈ 7 μs in the 40–80 K temperature range, a property advantageous for potential applications as a molecular spin qubit. Radical1is evaporated under ultrahigh vacuum (UHV) forming assemblies of intact radicals on a silicon substrate, as confirmed by high-resolution X-ray photoelectron spectroscopy (XPS). Scanning electron microscope (SEM) images indicate that the radical molecules form nanoneedles on the substrate. The nanoneedles are stable for at least 64 hours under air as monitored by using X-ray photoelectron spectroscopy. Electron paramagnetic resonance (EPR) studies of the thicker assemblies, prepared by UHV evaporation, indicate radical decay according to first-order kinetics with a long half-life of 50 ± 4 days at ambient conditions.