Deposition of Low Stress Amorphous Zinc Tin Oxide at Ambient Temperature Using a Remote Plasma Sputtering Process Suitable for Delicate Substrates
Deposition of Low Stress Amorphous Zinc Tin Oxide at Ambient Temperature Using a Remote Plasma Sputtering Process Suitable for Delicate Substrates
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使用适用于精致基板的远程等离子体溅射工艺在环境温度下沉积低应力非晶氧化锌锡
DOI：
10.1149/05008.0073ecst
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发表时间：
2013
期刊：
影响因子：
--
通讯作者：
Pfaendler S
中科院分区：
文献类型：
--
作者：
Pfaendler S
本文研究了用氩气等离子体和氧气射流从金属靶上远程溅射制备的ZnxSnyOz薄膜（厚度< 100nm）的材料特性。当沉积在塑料上时，没有观察到可见的变形或卷曲。材料被证实是无定形的，并且范围在5和10原子%之间。用x射线衍射、x射线光电子能谱和x射线能量色散谱测定锡浓度。随着时间的推移影响材料组成的因素进行了讨论。怀疑Sn随着目标年龄的增长而耗尽。
ZnxSnyOz thin films (< 100nm thickness), deposited by remote sputtering from a metal target using a confined argon plasma and oxygen gas jet near the sample, were investigated for their material properties. No visible deformation or curl was observed when deposited on plastic. Materials were confirmed to be amorphous and range between 5 and 10 at.% Sn concentration by x-ray diffraction, x-ray photoemission spectroscopy and energydispersive x-ray spectroscopy. Factors affecting the material composition over time are discussed. Depletion of the Sn as the target ages is suspected.