Magnetic properties of FePd films grown on Si antidots
Magnetic properties of FePd films grown on Si antidots
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DOI：
10.1016/j.jmmm.2006.11.070
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发表时间：
2007-03
影响因子：
2.7
通讯作者：
C. Yu;Y. Yao;S. Chou
中科院分区：
文献类型：
--
作者：
C. Yu;Y. Yao;S. Chou
本研究首先在MgO（100）衬底上采用纳米球光刻和反应离子刻蚀法制备了15nm厚的Si反点。然后，在500℃下在Si反点上沉积30nm厚的FePd合金膜1h。通过这种方法，我们控制了FePd亚微点阵列的形成以及FePd合金与Si反点相互扩散形成的FePd:Si基体的形成。同时，磁力显微镜研究表明，FePd亚微点阵列的磁畴被FePd:Si矩阵分离。
In this study, 15nm thick Si antidots were first fabricated by nanosphere lithography and reactive-ion etching on MgO (100) substrates. Then, 30nm thick FePd alloy films were deposited on the Si antidots at 500°C for 1h. Through this method, we controlled the formation of FePd sub-micro dot arrays and FePd:Si matrix that formed by the interdiffusion between FePd alloy and Si antidots. Meanwhile, the investigation of magnetic force microscopy showed that the magnetic domains of FePd sub-micro dot arrays were separated by FePd:Si matrix.