A Selective-Area Metal Bonding InGaAsP–Si Laser
A Selective-Area Metal Bonding InGaAsP–Si Laser
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DOI:
10.1109/lpt.2010.2050683
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发表时间:
2010-05
影响因子:
2.6
通讯作者:
T. Hong;G. Ran;Ting Chen;Jiao-qing Pan;Wei-xi Chen;Yang Wang;Yuanbing Cheng;S. Liang;
中科院分区:
文献类型:
--
作者:
T. Hong;G. Ran;Ting Chen;Jiao-qing Pan;Wei-xi Chen;Yang Wang;Yuanbing Cheng;S. Liang;
A 1.55-μ m hybrid InGaAsP-Si laser was fabricated by the selective-area metal bonding method. Two Si blocking stripes, each with an excess-metals accommodated space, were used to separate the optical coupling area and the metal bonding areas. In such a structure, the air gap between the InGaAsP structure and Si waveguide has been reduced to be negligible. The laser operates with a threshold current density of 1.7 kA/cm2 and a slope efficiency of 0.05 W/A under pulsed-wave operation. Room-temperature continuous lasing with a maximum output power of 0.45 mW is realized.