Micropatterning of high-T/sub c/ superconducting film by nitrogen ion beam and Ta/resist multilayer mask
Micropatterning of high-T/sub c/ superconducting film by nitrogen ion beam and Ta/resist multilayer mask
复制标题
利用氮离子束和 Ta/抗蚀剂多层掩模对高温/亚c/超导薄膜进行微图案化
DOI：
10.1109/20.133496
复制
发表时间：
1991
影响因子：
2.1
通讯作者：
K. Yanagisawa
中科院分区：
文献类型：
--
作者：
Y. Nagai;K. Tsuru;A. Terada;K. Yanagisawa
研究了用于电子设备的 BiSrCaCuO/SS 超导薄膜的微图案化。氮离子束和Ta/抗蚀剂多层掩模的组合被发现适合于实现具有锐利边缘的微图案，因为其具有超过20的高选择性。抗蚀剂层使得能够在相对粗糙的表面上形成高分辨率掩模。此外，金保护层成功避免了氧等离子体导致的临界温度下降。因此，可以在不降低临界温度和临界电流密度的情况下对宽度为 1.5 微米、厚度为 1 微米的 BiSrCaCuO 微桥进行图案化。因此，这些图案化技术被认为可用于制造 SQUID（超导量子干涉装置）和微波组件。
Micropatterning of BiSrCaCuO/ss superconducting film is investigated for electronic devices. A combination of nitrogen ion beam and Ta/resist multilayer mask is found to be suitable for achieving micropatterns with sharp edges because of its high selectivity of more than 20. The resist layer enables high-resolution masks to be formed on relatively rough surfaces. Also, an Au protective layer successfully avoids the critical temperature degradation due to oxygen plasma. As a result, BiSrCaCuO microbridges, 1.5- mu m wide and 1- mu m thick, can be patterned without degradation of the critical temperature and critical current density. Accordingly, these patterning techniques are thought to be useful for fabricating SQUIDs (superconducting quantum interference devices) and microwave components.