Electrochemical Formation of Laminar Deposits of Controlled Structure and Composition II . Dual Current Pulse Galvanostatic Technique
Electrochemical Formation of Laminar Deposits of Controlled Structure and Composition II . Dual Current Pulse Galvanostatic Technique
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受控结构和成分的层状沉积物的电化学形成II。
DOI：
10.1149/1.2096987
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发表时间：
1987
期刊：
影响因子：
--
通讯作者：
V. Jović
中科院分区：
文献类型：
--
作者：
A. Despić;V. Jović
介绍了一种通过电化学沉积获得层状金属的方法。它以脉动电流为基础，提供相对于金属1的总浓差极化，作为同时沉积这两种金属的先决条件。推导出了这两种金属层的厚度以及含有这两种金属的层的组成的方程。该体系适用于两个体系：铜-铅和铜-镍，分别代表固相中完全不相容和完全相容的两个极端。在第一个系统中，发生置换反应，这导致在关闭期间不那么贵重的金属实际上被溶解。考虑了取代反应的动力学。
A method of obtaining laminar metals by electrochemical deposition is described. It is based on a pulsating current regime, which provides total concentration polarization with respect to metal 1, as a prerequisite for simultaneous deposition of both metals. Equations are derived for thickness of both layers, as well as for the composition of the layer containing both metals. The regime was applied to two systems: copper‐lead and copper‐nickel, representing two extremes of total immiscibility and total miscibility in the solid phase, respectively. In the first system, the replacement reaction takes place, which leads to a virtual dissolution of the less noble metal during the off period. The kinetics of the replacement reaction are considered.