The behavior of aluminum in alkaline media

The behavior of aluminum in alkaline media
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DOI:
10.1016/s0010-938x(00)00055-x
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发表时间:
2000-12
期刊:
影响因子:
8.3
通讯作者:
K. C. Emregül;A. Aksut
K. C. Emregül;A. Aksut
中科院分区:
材料科学1区
文献类型:
--
作者:
K. C. Emregül;A. Aksut

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极化和阻抗测量进行铝在0.1,1和3摩尔/升NaOH。研究的频率范围为1×10−2-1× 104 Hz,电位范围为−2至−1 V vs. SCE。在极化实验中,电位被扩展到0 V vs. SCE。该系统的行为的特征在于由一个高频电容性回路有关的电荷转移由于溶解的金属,在中频的电感性回路,我们已经归因于表面粗糙化和第二电容性回路在低频下获得的已归因于调整的表面膜的电位的变化,从而导致更高的电荷转移电阻。
Polarization and impedance measurements were performed on aluminum in 0.1, l and 3 mol/l NaOH. The frequency range studied was 1×10−2–1×104Hz in the potential range −2 to −1 V vs. SCE. In polarization experiments the potential was extended up to 0 V vs. SCE. The behavior of the system was characterized by a high frequency capacitive loop related to the charge transfer due to dissolution of the metal, an inductive loop at medium frequency which we have attributed to surface roughening and a second capacitive loop obtained at low frequency which has been ascribed to the adjustment of the surface film to the change in potential resulting in higher charge transfer resistance.