pH-Responsive Schizophrenic Diblock Copolymers Prepared by Polymerization-Induced Self-Assembly.
pH-Responsive Schizophrenic Diblock Copolymers Prepared by Polymerization-Induced Self-Assembly.
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通过聚合诱导的自组装制备的pH响应性精神分裂症二嵌段共聚物。
DOI:
10.1021/acs.macromol.7b01005
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发表时间:
2017-08-22
期刊:
影响因子:
5.5
通讯作者:
Armes SP
中科院分区:
文献类型:
--
作者:
Canning SL;Neal TJ;Armes SP
Polymerization-induced self-assembly (PISA) is used for the highly convenient and efficient preparation of ampholytic diblock copolymer nanoparticles directly in acidic aqueous solution. Cationic nanoparticles comprising a protonated polyamine stabilizer block and a hydrophobic polyacid core-forming block are formed at pH 2. Micelle inversion occurs at pH 10 to produce anionic nanoparticles with an ionized polyacid stabilizer block and a hydrophobic polyamine core-forming block. Macroscopic precipitation occurs at around pH 6–7, which lies close to the isoelectric point of this ampholytic diblock copolymer. Incorporation of fluorescein and rhodamine dye labels into the acid and amine blocks, respectively, leads to dual-color bifluorescent self-reporting pH-responsive nanoparticles.
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