(Invited) Area-selective spatial ALD of SiO2 interleaved with back-etch corrections: Selectivity and surface inspection of non-growth area

(Invited) Area-selective spatial ALD of SiO2 interleaved with back-etch corrections: Selectivity and surface inspection of non-growth area
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(特邀)SiO2 的区域选择性空间 ALD 与回蚀校正交错:非生长区域的选择性和表面检测

DOI:
10.1149/ma2021-0121839mtgabs
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发表时间:
2021
期刊:
ECS Meeting Abstracts
影响因子:
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通讯作者:
Mameli A
Mameli A
中科院分区:
--
文献类型:
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作者:
Mameli A

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