Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid
Room temperature atomic layer deposition of niobium oxide using plasma excited humidified argon and its application to anticorrosion to hydrochloric acid
复制标题
等离子体激发湿氩室温原子层沉积氧化铌及其在盐酸防腐中的应用
DOI：
10.1116/1.5116844
复制
发表时间：
2019
影响因子：
2.9
通讯作者：
Hirose Fumihiko
中科院分区：
文献类型：
--
作者：
Yoshida Kazuki;Tokoro Kentaro;Kanomata Kensaku;Miura Masanori;Saito Kentaro;Ahmmad Bashir;Kubota Shigeru;Hirose Fumihiko
