Mechanophotopatterning on a Photoresponsive Elastomer
Mechanophotopatterning on a Photoresponsive Elastomer
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DOI：
10.1002/adma.201100323
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发表时间：
2011-05-03
影响因子：
29.4
通讯作者：
Bowman, Christopher N.
中科院分区：
文献类型：
--
作者：
Kloxin, Christopher J.;Scott, Timothy F.;Bowman, Christopher N.
机械光图案化下的光可逆共价弹性体网络的光图案化提供了一种使用基本辐照方案制造复杂地形特征的简便方法。光响应材料在二维上变形并通过掩模照射，产生具有反映掩模同心环形貌的透明材料。
Photopatterning of a photoreversible covalent elastomeric network under mechanical :train, or mechanophotopatterning, provides a facile approach to fabricate complex topographical features using elementary irradiation schemes. A photoresponsive material is deformed in two dimensions and irradiated through a mask, resulting in a transparent material with topography that reflects the concentric rings of the mask.