The role of chemical structure on the magnetic and electronic properties of Co2FeAl0.5Si0.5/Si(111) interface
The role of chemical structure on the magnetic and electronic properties of Co2FeAl0.5Si0.5/Si(111) interface
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DOI：
10.1063/1.4948466
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发表时间：
2016-04-25
影响因子：
4
通讯作者：
Lazarov, Vlado K.
中科院分区：
文献类型：
--
作者：
Kuerbanjiang, Balati;Nedelkoski, Zlatko;Lazarov, Vlado K.
结果表明，在Si（111）衬底上沉积的Co_2FeAl_（0.5）Si_（0.5）薄膜具有单晶结构，并与衬底有孪晶相关的外延关系。亚纳米电子能量损失谱表明，在一个狭窄的界面区域有一个相互扩散为主的Si和Co。原子分辨率像差校正扫描透射电子显微镜显示，该膜具有B2有序。薄膜晶格结构是不变的，即使在界面处，由于替代性质的混合。使用基于像差校正的电子显微镜的结构模型进行的第一性原理计算表明，增加的Si掺入在膜中导致的磁矩逐渐减少，以及显着的自旋极化减少。这些影响可以有显着的有害作用的自旋注入从Co2FeAl0.5Si0.5薄膜到Si衬底上，除了该结的结构完整性。(C)2016年作者。所有文章内容，除非另有说明，是根据知识共享署名（CC BY）许可证许可
We show that Co2FeAl0.5Si0.5 film deposited on Si(111) has a single crystal structure and twin related epitaxial relationship with the substrate. Sub-nanometer electron energy loss spectroscopy shows that in a narrow interface region there is a mutual inter-diffusion dominated by Si and Co. Atomic resolution aberration-corrected scanning transmission electron microscopy reveals that the film has B2 ordering. The film lattice structure is unaltered even at the interface due to the substitutional nature of the intermixing. First-principles calculations performed using structural models based on the aberration corrected electron microscopy show that the increased Si incorporation in the film leads to a gradual decrease of the magnetic moment as well as significant spin-polarization reduction. These effects can have significant detrimental role on the spin injection from the Co2FeAl0.5Si0.5 film into the Si substrate, besides the structural integrity of this junction. (C) 2016 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution (CC BY) license