Efficient Light Trapping Structures for Organic Photovoltaics Fabricated by Nanoimprint Lithography
Efficient Light Trapping Structures for Organic Photovoltaics Fabricated by Nanoimprint Lithography
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DOI：
10.2494/photopolymer.33.103
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发表时间：
2020-07
影响因子：
0.8
通讯作者：
S. Kubota;Kenta Hiraga;K. Kanomata;B. Ahmmad;J. Mizuno;F. Hirose
中科院分区：
文献类型：
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作者：
S. Kubota;Kenta Hiraga;K. Kanomata;B. Ahmmad;J. Mizuno;F. Hirose
为了提高有机光伏（OPVs）的效率，利用表面纳米结构（如蛾眼结构）捕获入射光是增强光活性层吸收的一种非常有用的策略。纳米压印技术是一种广泛应用的技术，可以有效地生产大面积纳米结构。然而，通过纳米压印工艺制备的蛾眼纹理必须包含相邻锥体之间的空间间隙，这可能会降低纹理表面的抗反射性能。在这项研究中，我们对具有蛾眼涂层的opv进行了光学模拟，以探索蛾眼阵列的空间间隙及其几何模式对光电流产生的影响。我们发现光电流水平随着飞蛾眼内空间间隙大小的增加而显著地超线性下降，这表明充分缩小间隙大小的重要性。此外，我们还通过实验测量了具有接近最优几何图案和减小间隙尺寸的蛾眼结构的OPV电池的性能，以验证模拟结果。
To improve the efficiency of organic photovoltaics (OPVs), the trapping of incident light with surface nanostructures, such as moth eye structures, is a highly useful strategy for enhancing absorption in the photoactive layer. Nanoimprint lithography is a widely used technique to produce large-area nanostructures cost effectively. However, the moth eye texture fabricated by the nanoimprint process necessarily contains a spatial clearance between adjacent cones, which could degrade the antireflective property of the textured surface. In this study, we perform optical simulations for the OPVs with moth eye coating to explore the effects of the spatial clearance in the moth eye array as well as its geometric pattern on the photocurrent generation. We show that the photocurrent level decreases significantly and superlinearly with increases in the size of the spatial clearance in moth eye, suggesting the importance of sufficiently narrowing the clearance size. Furthermore, we experimentally measure the performance of the OPV cell incorporated with the moth eye structure having a near-optimal geometric pattern with reduced clearance size to verify the simulation results.