Radical and film growth kinetics in methane radio‐frequency glow discharges
Radical and film growth kinetics in methane radio‐frequency glow discharges
复制标题
甲烷射频辉光放电中的自由基和薄膜生长动力学
DOI：
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发表时间：
1996
期刊：
影响因子：
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通讯作者：
J. Doyle
中科院分区：
文献类型：
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作者：
D. Dagel;C. Mallouris;J. Doyle
研究了30 mTorr射频甲烷辉光放电的气体动力学，作为甲烷耗尽的函数，包括适合于硬碳薄膜沉积的条件。质谱法用于测量物质C2H6、C2H4、C2H2、C3H8、C3H6和C3H4的分压。使用质量平衡计算净膜生长，并通过直接测量沉积速率来证实。使用静态和流动放电测量的组合，C2H6，C2H4，和C2H2的净产量描述使用一个简单的分析模型。C2H6被建模为CH3重组的产物，C2H4的产生被建模为CH与CH 4的反应，其中CH可以通过CH 4的直接电子碰撞解离以及CH 2与H的反应来产生。C2H2生产被建模为主要由C2H4消耗产生。这些分子的主要解离机制似乎是电子碰撞解离。由此推导出了CH_3自由基的密度。
The gas kinetics of a 30 mTorr radio‐frequency methane glow discharge are studied as a function of methane depletion including conditions suitable for hard carbon thin‐film deposition. Mass spectrometry is used to measure the partial pressures of the species C2H6, C2H4, C2H2, C3H8, C3H6, and C3H4. Net film growth was calculated using mass balance and corroborated by direct measurements of deposition rate. Using a combination of static and flowing discharge measurements, the net yields of C2H6, C2H4, and C2H2 are described using a simple analytic model. C2H6 is modeled as a production from CH3 recombination, and the production of C2H4 is modeled as reaction of CH with CH4 where the CH can be produced both by direct electron collisional dissociation of CH4 as well as reaction of CH2 with H. C2H2 production is modeled as arising principally from C2H4 depletion. The principal dissociation mechanism of these molecules appears to be electron collisional dissociation. The CH3 radical densities deduced from this ...