General theory of Maker fringes in crystals of low symmetry
General theory of Maker fringes in crystals of low symmetry
复制标题
低对称性晶体中制造商条纹的一般理论
DOI：
10.1088/0953-8984/3/8/010
复制
发表时间：
1991
期刊：
影响因子：
--
通讯作者：
D. Pugh
中科院分区：
文献类型：
--
作者：
P. Pavlides;D. Pugh
已经导出了一组适用于所有晶体结构和取向的 Maker 条纹的通用方程。给出了方程的替代形式，适用于数值工作或在对称性或其他因素降低其复杂性的情况下进行分析简化。特殊情况的公式是从一般方程中得出的，并将结果与之前发表的工作进行比较。更详细地讨论了单斜对称的情况，并给出了将公式应用于 d 系数研究的数值示例。
A set of general equations for Maker fringes, applicable to all crystal structures and orientations, has been derived. Alternative forms of the equations are given, suitable for numerical work or for analytical reduction in cases where symmetry or other factors reduce their complexity. Formulae for special cases have been obtained from the general equations and the results compared with previously published work. The case of monoclinic symmetry has been discussed in more detail and a numerical example of the application of the formulae to the study of the d-coefficients is presented.