Raman enhancement on ultra-clean graphene quantum dots produced by quasi-equilibrium plasma-enhanced chemical vapor deposition.
Raman enhancement on ultra-clean graphene quantum dots produced by quasi-equilibrium plasma-enhanced chemical vapor deposition.
复制标题
对准平衡等离子体增强化学气相沉积生产的高质量超洁净石墨烯量子点进行有效拉曼增强
DOI:
10.1038/s41467-017-02627-5
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发表时间:
2018-01-15
影响因子:
16.6
通讯作者:
Wei D
中科院分区:
文献类型:
--
作者:
Liu D;Chen X;Hu Y;Sun T;Song Z;Zheng Y;Cao Y;Cai Z;Cao M;Peng L;Huang Y;Du L;Yang W;Chen G;Wei D;Wee ATS;Wei D
Graphene is regarded as a potential surface-enhanced Raman spectroscopy (SERS) substrate. However, the application of graphene quantum dots (GQDs) has had limited success due to material quality. Here, we develop a quasi-equilibrium plasma-enhanced chemical vapor deposition method to produce high-quality ultra-clean GQDs with sizes down to 2 nm directly on SiO2/Si, which are used as SERS substrates. The enhancement factor, which depends on the GQD size, is higher than conventional graphene sheets with sensitivity down to 1 × 10−9 mol L−1 rhodamine. This is attributed to the high-quality GQDs with atomically clean surfaces and large number of edges, as well as the enhanced charge transfer between molecules and GQDs with appropriate diameters due to the existence of Van Hove singularities in the electronic density of states. This work demonstrates a sensitive SERS substrate, and is valuable for applications of GQDs in graphene-based photonics and optoelectronics. Surface-enhanced Raman spectroscopy (SERS) is a promising technology for sensitive optical sensors, generally using rough metal films. Here, Liu et al. synthesize high-quality graphene quantum dot films which offer a large SERS enhancement due to a strong light-matter interaction with Van Hove singularities.
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影响因子:
17.1
作者:
Cheng, Huhu;Zhao, Yang;Shi, Gaoquan
通讯作者:
Shi, Gaoquan
影响因子:
56.9
作者:
Britnell, L.;Ribeiro, R. M.;Novoselov, K. S.
通讯作者:
Novoselov, K. S.
影响因子:
3.7
作者:
Huang, Bing;Li, Zuanyi;Duan, Wenhui
通讯作者:
Duan, Wenhui
影响因子:
17.1
作者:
Huh, Sung;Park, Jaesung;Nam, Jwa-Min
通讯作者:
Nam, Jwa-Min
影响因子:
3.7
作者:
Ling, Xi;Moura, L. G.;Zhang, Jin
通讯作者:
Zhang, Jin