Photosensitive polybenzoxazole based on a poly(o‐hydroxy amide), a dissolution inhibitor, and a photoacid generator
Photosensitive polybenzoxazole based on a poly(o‐hydroxy amide), a dissolution inhibitor, and a photoacid generator
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DOI：
10.1002/pola.21855
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发表时间：
2007-02
期刊：
影响因子：
--
通讯作者：
Tomohito Ogura;M. Ueda
中科院分区：
文献类型：
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作者：
Tomohito Ogura;M. Ueda
以聚邻羟基胺(PHA)、溶解缓蚀剂(DI)9，9-bis(4-tert-butoxycarbonyloxyphenyl)fluorene(t-Boc BHF)和光生酸剂(5-propylsulfonyloxyimino-5H-thiophene-2-ylidene)-(2-methylphenyl)acetonitrile(PTMA)为原料，制备了一种正电型光敏聚苯并恶唑。在4-二甲氨基吡啶存在下，由二叔丁基二碳酸酯类酚类化合物合成了几种新的叔丁氧羰基化合物作为对苯二甲酸二异丁酯。其中，t-Boc BHF和5，5‘，6，6’-tetra(tert-butoxycarbonyl)-3，3，3‘，3’-tetramethyl-1，1‘-spirobiindane作为良好的显色剂，在2.38wt%的四甲基氢氧化铵溶液(TMAHaq)/5wt%的异丙醇(i-PROH)中，暴露区域和非暴露区域之间有很大的溶出对比。研究了PSPBO体系的溶解行为与PTMA和t-Boc BHF负载量以及曝光后焙烧温度的关系。由PHA(77wt%)、t-Boc BHF(20wt%)和PTMA(3wt%)组成的PSPBO在365 nm光(I-LINE)下的感光度为34mJ/cm2，对比度为5.8，显影剂为2.38wt%TMAHaq/5wt%i-Proh。通过接触式印刷获得具有6-μm特征的清晰、正的图像和10-μm厚的高灵敏度和对比度的图案，并在350℃加热1h后转化为聚苯并恶唑图案。
A positive-type photosensitive polybenzoxazole (PSPBO), based on a poly (o-hydroxy amide) (PHA), the dissolution inhibitor (DI) 9,9-bis(4-tert-butoxycarbonyloxyphenyl)fluorene (t-Boc BHF), and the photoacid generator (5-propylsulfonyloxyimino-5H-thiophene-2-ylidene)-(2-methylphenyl)acetonitrile (PTMA), was developed. Several new tert-butoxycarbonylated compounds as DIs for PSPBOs were prepared from phenolic compounds having a cardolike structure with di-tert-butyl dicarbonate in the presence of 4-dimethylaminopyridine. Among them, t-Boc BHF and 5,5',6,6'-tetra(tert-butoxycarbonyl)-3,3,3',3'-tetramethyl-1,1'-spirobiindane acted as excellent DIs, giving a large dissolution contrast between the exposed and unexposed areas in a 2.38 wt % tetramethylammonium hydroxide solution (TMAHaq)/5 wt % iso-propanol (i-PrOH). The dissolution behavior of this PSPBO system was studied in relation to the PTMA and t-Boc BHF loadings and postexposure baking temperature. A PSPBO consisting of PHA (77 wt %), t-Boc BHF (20 wt %), and PTMA (3 wt %) exhibited a sensitivity of 34 mJ/cm 2 and a contrast of 5.8 when exposed to 365-nm light (i-line) and developed with an aqueous alkaline developer, 2.38 wt % TMAHaq/5 wt % i-PrOH. A clear, positive image with 6-μm features and a 10-μm-thick pattern with high sensitivity and contrast was produced by contact printing and converted into polybenzoxazole patterns upon heating at 350 °C for 1 h.