High thermal stability of cross-linked aromatic self-assembled monolayers:: Nanopatterning via selective thermal desorption
High thermal stability of cross-linked aromatic self-assembled monolayers:: Nanopatterning via selective thermal desorption
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DOI：
10.1063/1.2437091
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发表时间：
2007-01-29
影响因子：
4
通讯作者：
Goelzhaeuser, A.
中科院分区：
文献类型：
--
作者：
Turchanin, A.;El-Desawy, M.;Goelzhaeuser, A.
据报道，电子交联联苯自组装单层（SAM）具有极高的热稳定性。作者发现，原始联苯硫醇 SAM 在大约 400 K 的温度下从金表面解吸，这是由 C-S 键断裂引起的。尽管交联 SAM 中存在类似的键断裂，但这些键在高达 1000 K 的温度下仍保留在表面，这是报道的 SAM 的最高温度。当原始和交联 SAM 的图案被加热时，原始区域解吸，而交联区域保留在表面上。作者表明，这种热解吸光刻可用于分子表面纳米结构的制造。
An extremely high thermal stability of electron cross-linked biphenyl self-assembled monolayers (SAMs) is reported. The authors found that pristine biphenylthiol SAMs desorb at similar to 400 K from gold surfaces, which is induced by a breaking of C-S bonds. Despite of a similar bond cleavage in cross-linked SAMs, these remain on the surface up to 1000 K, which is the highest temperature reported for a SAM. When patterns of pristine and cross-linked SAMs are heated, the pristine regions desorb, and the cross-linked regions remain on the surface. The authors show that this thermal desorption lithography can be utilized for the fabrication of molecular surface nanostructures.