The role of neutral drag force in pulsed plasma enabled particle contamination control
The role of neutral drag force in pulsed plasma enabled particle contamination control
复制标题
脉冲等离子体中中性阻力的作用实现了颗粒污染控制
DOI：
--
复制
发表时间：
2023
期刊：
影响因子：
--
通讯作者：
T. Peijnenburg
中科院分区：
文献类型：
--
作者：
J. Beckers;J. V. van Huijstee;P. Blom;Federico Medini;T. Peijnenburg
由于制造的半导体结构的长度尺寸不断减小，超净半导体加工设备越来越多地受到纳米和微米尺寸颗粒的污染，这些颗粒可能通过外部注入的气流或通过平移和/或旋转（机器人）馈通从外部引入到此类系统中。过滤这些气流中的污染颗粒的一种有前途的方法是应用等离子体颗粒密封，其中气流携带的空气中的颗粒从等离子体中获取自由电荷，然后在等离子体余辉区域中被外部施加的电场偏转。接下来，这些污染颗粒可以被引导到系统中危害较小的位置，甚至被完全去除。在这篇文章中，我们提出的测量结果揭示了当等离子体在脉冲模式下运行时，施加在粒子上的额外阻力的重要性以及这些阻力对粒子轨迹的影响。
Driven by the continuous decrease of the length scales of fabricated semiconductor structures, ultraclean semiconductor processing equipment suffers more and more from contamination with nano- and micrometer sized particles, which may be introduced in such systems from the outside via gas flows either externally injected or through translational and/or rotational (robotic) feedthroughs. One promising approach to filter contaminating particulates from these gas flows is the application of a plasma particle seal in which airborne particles carried by a gas flow pick up free charges from a plasma and then are deflected by an externally applied electric field in the plasma’s afterglow region. Consecutively, these contaminating particles may be guided to less harmful locations in the system or even be fully removed. In this contribution, we present measurements that reveal the importance of additional drag forces imposed on the particles and the influence of these drag forces on the particles’ trajectories when the plasma is operated in pulsed mode.
影响因子：
15.1
作者：
Chen, Xiaoshuang;Hogan, Christopher J., Jr.
通讯作者：
Hogan, Christopher J., Jr.